Advanced Eddy-Current Technology for Sheet Resistance Measurement

Sheet Resistance Thin Film

SWS-Tec’s Advanced Eddy-Current Technology for Sheet Resistance Measurement

Sheet Resistance Thin Film – Our eddy-current-based sheet resistance measurement technology provides a highly accurate, non-contact sheet resistance solution. Unlike traditional methods, our non-contact sheet resistance approach ensures precise measurements without damaging materials. Designed for advanced applications, our eddy current-based sheet resistance measurement system can reliably measure sheet resistance across a range of conductive materials, delivering consistent, non-destructive results. Whether you’re looking to enhance quality control or boost production efficiency, our sheet resistance technology meets the highest standards for accuracy and reliability.

For a more detailed explanation about sheet resistance please check out our technology page.

Sheet Resistance Thin Film

Measurement geometry to define resistivity.

Sheet Resistance Thin Film

Measurement geometry to define sheet resistance.

Precision Sheet Resistance Measurement on Thin Films

Sheet Resistance Thin Film – Our advanced sheet resistance measurement technology is specially optimized for thin films, offering accurate, non-contact measurements that preserve the integrity of delicate layers. Utilizing an eddy-current-based approach, our system provides fast, reliable sheet resistance measurement on thin films without the need for physical contact, making it a non-destructive solution ideal for sensitive materials.

Whether used for quality control in semiconductor manufacturing or material analysis in research, our thin-film sheet resistance measurement system ensures precise, repeatable results across a range of conductive and semi-conductive materials. Experience the efficiency and accuracy of our technology for high-performance thin-film applications, where precision and material preservation are essential.

 

Key Applications

  • Thin-Film Technologies: Ideal for assessing thin-film materials after deposition processes like PVD, CVD, MBE and ALD.
  • Semiconductor Applications: Suitable for a wide range of semiconductor materials, like Si, GaN and SiC, supporting both research and production needs.
  • Solar and Photovoltaic Applications: Designed to measure and optimize materials used in solar cells and other photovoltaic technologies.
  • Innovative Glass Technologies: Applicable to architectural glass such as Low-E (low emissivity) glass and smart glass technologies.
  • Lighting and Display Technologies: Supports OLED and LED material testing and development.

Understanding Sheet Resistance and Resistivity

Sheet Resistance (R_S):

Is a measure of resistance of thin films that are uniformly thick. It is useful for materials like conductive coatings and semiconductor wafers, where thickness is minimal compared to the length and width.

Resistivity (ρ):

Is an intrinsic property of a material that quantifies how strongly it resists electric current. It is dependent on the material’s nature and temperature but not on its shape or size.

Key Differences:

  • Scope: Resistivity is a bulk property of a material, while sheet resistance is specific to thin films.
  • Dependence: Resistivity depends on the material and temperature, whereas sheet resistance depends on both the resistivity and the thickness of the film.

Sheet Resistance (R_S)

Sheet resistance is given in ohms per square (Ω/sq) and can be calculated using:
Layer Thickness Meaturement

where:

  • ρ is the Resistivity of the material (Ω⋅m)
  • t is the thickness of the material (m)


Resistivity (
ρ)

Resistivity is given in ohm-meters (Ω·m) and can be calculated using:
Sheet Resistance Thin Film

where:

  • ρ is the Resistivity of the material (Ω⋅m)
  • R is the Resistance of the material (Ω)
  • A is the cross-sectional area of the material (m^2)
  • L is the length of the material (m)

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